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SPD method small low-cost film deposition device! Maximum substrate size is 100mm x 100mm.
It is a small, low-cost film deposition device using the SPD method. Maximum substrate size: 100mm x 100mm *For more details, please refer to the catalog or feel free to contact us. This catalog is available in English.
FTO with a transmittance rate of over 80% and sheet resistance of 8Ω/□ or less! A deposition device that excels in laboratories and development sites, in a tabletop type. *Catalog and samples available.
This is a series of small, low-cost film deposition devices (thin film manufacturing devices) using the SPD method. SPD devices can be generated without a vacuum, so a clean room is not necessary. Additionally, the equipment is compact and tabletop in design, making it ideal for use in laboratories and development sites. 【Features】 ■ Compact thin film manufacturing device in a tabletop design ■ No clean room required due to non-vacuum operation 【Product Lineup】 ■ KM-300 ■ KV-25 ■ KV-50 ■ KM-150 ■ KV-100 *For more details, please refer to the PDF document or feel free to contact us.
SPD method small low-cost film deposition device! Maximum substrate size is 25mm x 25mm.
It is a small, low-cost film deposition device using the SPD method. Maximum substrate size: 25mm x 25mm *For more details, please refer to the catalog or feel free to contact us. This catalog is available in English.
It enables control of film thickness on the nanometer order!
The "Nano Film Maker" is a thin film manufacturing device that enables control of film thickness at the nano scale through sensing using quartz crystal microbalance (QCM). This device allows for the development of functional thin films called "alternating adsorption films," which are generated by utilizing the attractive forces between anionic and cationic polymers to adsorb and continuously stack the films. By examining combinations of materials, it can also be useful for the production of conductive films used in touch panels. 【Features】 ■ Achieves film thickness control at the nano scale ■ Allows for free design of heterostructures ■ Capable of accumulating monomers (such as Ru complexes) ■ Various functional thin films can be developed *For more details, please refer to the catalog or feel free to contact us.
Utilizing high-output xenon excimer lamps! Introduction to the film deposition rate of the light CVD method.
By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the film formation of thin films used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new film formation methods will continue in the future. In this document, we present the results of our examination of the potential of a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film formation speed of the photochemical CVD method using a "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
Introducing FHR, which offers excellent technical capabilities and high-quality bonded sputtering targets!
FHR Anlagenbau GmbH is an innovative company in the field of vacuum processes and thin film technology. It was established in 1991 in Dresden, Germany, by a group of engineers with excellent technical skills aimed at developing and selling new concepts and solutions for multiple applications of thin films. FHR provides thin film technology and offers customized equipment for a wide range of applications to customers worldwide. [Included in the FHR Technology Portfolio] ■ Advanced metallization technology through magnetron sputtering and CVD ■ Reactive sputtering technology for the deposition of oxides and nitrides ■ Advanced etching technology supported by high-density plasma sources ■ Flash lamp annealing (FLA) for processing and modifying semiconductors, metals, ceramics, nanostructures, and photonic materials ■ Atomic layer deposition (ALD) technology for single-layer bonding with excellent uniformity through advanced film deposition control on complex 3D shapes *For more details, please refer to the PDF document or feel free to contact us.
